Scanning Electron Microscope (MEV) - JEOL JSM-7800F
Scanning Electron Microscope (MEV) - JEOL JSM-7800F
More:
The JSM-7800F Scanning Electron Microscope utilizes Super Hybrid Lens (SHL) technology to achieve high resolution without sacrificing operability. With an energy filter mounted directly below the upper electron detector (UED), secondary electrons and backscattered electrons can be accurately selected even at low accelerating voltages, allowing observation of the composition of the upper surface of the sample. The JSM-7800F incorporates 4 types of detectors, including an upper electron detector (UED), upper secondary electron detector (USD), backscattered electron detector (BED) and a lower electron detector (LED).
Specification:
Resolution: 0.8 nm(15 kV)
1.2 nm (1 kV)
3.0 nm (15kV、5nA、WD10mm)
Magnitude: ×25 to ×1,000,000(SEM)
Voltage Acceleration: 0.01kV to 30kV
Detectors: Upper Electron Detector(UED)
Lower Electron Detector(LED)
Optical Microscope - Nikon Eclipse LV100ND
Optical Microscope - Nikon Eclipse LV100ND
More:
The LV100ND POL/DS is a high-performance polarized light microscope with accessories that allow you to observe scattering spots at up to 400x magnification. The LV100ND POL/DS uses optics with high extinction factors, making it easy to detect and observe high-precision optical properties.
Specification:
Sample size: Up to 100 mm;
Available lenses (conventional optical microscope): 5x, 10x, 20x, 50x, 100x and 150x;
Software for measurements and photographs;
Manual operation;
Available inside the clean rooms for inspection of samples in the processing phase.
Reactive ion etching (RIE) – Plasma Pro NGP80 – Oxford Instruments - Fapesp 2012/50259-8
Reactive ion etching (RIE) – Plasma Pro NGP80 – Oxford Instruments - Fapesp 2012/50259-8
More:
The PlasmaPro 80 reactive ion etch (RIE) is a compact system. Its design allows for fast wafer loading and unloading, ideal for research, prototyping and low-volume production. It enables high performance processes using optimized electrode cooling and excellent substrate temperature control.
Specification:
Substrate Size: Can etch 8mm x 8mm samples up to 100mm diameter wafers;
Available gases: CF4, SF6, CHF3, O2, Air;
System dedicated to Silicon corrosion.
Atomic Force Microscope (AFM) - Dimension Icon – Bruker
Atomic Force Microscope (AFM) - Dimension Icon – Bruker
More:
Atomic force microscopy (AFM) has become a very present tool in the characterization of surfaces, due to its flexibility of operation, variety of analyzed properties and resolution in the nanometric scale. Bruker's Dimension Icon® brings the highest levels of AFM performance, functionality and affordability to nanoscale researchers in science and industry.
Specification:
High Performance - State-of-the-art scanner offers unrivaled resolution with reduced noise levels and drift rates <200 pm.
Versatile – Open access platform accommodates the widest variety of experiments, modes, techniques and semi-automated measurements.
Easy Productivity - Provides surprisingly simple setup, intuitive workflow and fast time-to-results for quality data.
E-beam evaporation - Fapesp 2012/50259-8
E-beam evaporation - Fapesp 2012/50259-8
More:
Electron beam induced deposition (E-beam evaporation)
Specification:
Source: 5kV;
Current: max. 600 mA;
Sample size: ≤ 100 mm;
Deposition chamber with capacity for up to 4 targets;
Working pressure in the order of 1 x 10-7 Torr;
Equal size 2cc vitreous carbon crucibles
Available materials: Au, Cr and Al2O3
Atomic Layer Deposition 410L - Fapesp 2012/50259-8
Atomic Layer Deposition 410L - Fapesp 2012/50259-8
More:
The AT410 ALD system provides a solution for conductive and shaped thin films for 3D sample preparation, while providing traditional 2D coatings that are currently grown using sputtering/evaporation.
It has an ozone generator.
Specification:
Sample holders up to 4” in diameter.
Processes with up to 5 precursors (Oxides, Elementals, Nitrides and Sulphides)
Deposition of: aluminum oxide, silicon dioxide and titanium dioxide.
High quality for small sample growth projects.
Precise dosing system.
Heating plate TE-038/2-MP
Heating plate TE-038/2-MP
More:
Specification:
Temperature: 50°C to 300°C
Temperature controller: Digital microprocessor with PID system and RBC calibration certificate
Control accuracy: ±2°C
Plate: In aluminum see
Teflon coating 400x300 mm
Spin Coater – Best Tools
Spin Coater – Best Tools
SC110-B Spin Coaters are designed to coat a variety of substrates from small pieces to 8” round wafers.
Specification:
Substrate Size: Up to 8” diameter wafers;
Maximum speed: 10,000 rpm;
Vacuum: Venturi (Heavy samples should be rotated at a lower speed – risk of being thrown).
Laser lithography system (Micro Writer ML3) (Direct Prototyping)
Laser lithography system (Micro Writer ML3) (Direct Prototyping)
More:
Micro Writer ML3 (Direct prototyping)
A direct engraving photolithography machine for rapid prototyping
Specification:
Source: High power laser with 405 nm spectrum;
Substrate size: up to 100 mm diameter wafers;
1 µm resolution
Polarization Microscope - Eclipse LV100ND POL/DS (Yellow Room)
Polarization Microscope - Eclipse LV100ND POL/DS (Yellow Room)
More:
The LV100ND POL/DS is a high-performance polarized light microscope with accessories that allow you to observe scattering spots at up to 400x magnification. The LV100ND POL/DS uses optics with high extinction factors, making it easy to detect and observe high-precision optical properties.
Specification:
Sample size: Up to 100 mm;
Available lenses (conventional optical microscope): 5x, 10x, 20x, 50x, 100x and 150x;
Software for measurements and photographs;
Manual operation;
Available inside the clean rooms for inspection of samples in the processing phase, it has a green filter.
Polypropylene chapel for cleaning samples
Polypropylene chapel for cleaning samples
More:
Polypropylene hood for sample cleaning
Specification:
organic cleaning
Organic cleaning with piranha solution;
RCA cleaning;
Ultrasonic bath;
N2 Pistols available in all chantries.
Plasma surface treatment (ZEPTO VERSION 2)
Plasma surface treatment (ZEPTO VERSION 2)
More:
PLASMA ZEPTO VERSION 2
Chamber Dimension: 105mm in diameter by 300mm in depth.
Chamber Material: Quartz
Chamber Volume: approximately 2.6 liters.
Gas supply: 2 individually adjustable gas channels (flow meter)
Generator: 40KHz/100W.
Operation in oxygen and/or argon atmosphere.